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TECHNOLOGIES

Technologies of CIT


Introducing CIT's innovative technologies.

Atomic Sputtering Epitaxy (ASE)

ASE deposition is a technology that builds up atoms layer by layer. 


This technology is based on the RF sputter method. Electrical and mechanical vibrations are blocked externally, and single crystal targets are used internally to allow atoms to be stacked on the substrate one layer at a time. 


Using this technology, it is possible to produce high-quality copper thin films on various substrates including PTFE, sapphire, and glass.

Atomic Sputtering Epitaxy (ASE)

ASE deposition is a technology that builds up atoms layer by layer. 


This technology is based on the RF sputter method. Electrical and mechanical vibrations are blocked externally, and single crystal targets are used internally to allow atoms to be stacked on the substrate one layer at a time.


Using this technology, it is possible to produce high-quality copper thin films on various substrates including PTFE, sapphire, and glass.


Technical paper